electrostatic deflection

基本解释

Superior to the electrostatic deflection of the old plate, folded one is used in aberration.
结果表明，折板结构静电偏完成的图像像差明显优于原直板结构静电偏。
Some suggestions to improve uniformity of the periphery of electrostatic deflection field are outlined in the discussion.
讨论中提出了一些改善静电偏转场边缘区均匀性的建议。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
以SDS -3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。